Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices - Young-Hee Kim - 图书 - Springer International Publishing AG - 9783031014246 - 2007年12月31日
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Young-Hee Kim
Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices

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Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. The origin of soft breakdown (first breakdown) was studied and the results suggested that the soft breakdown may be due to one layer breakdown in the bilayer structure (HfO2/SiO2: 4 nm/4 nm).

92 pages, X, 92 p.

介质类型 图书     Paperback Book   (平装胶订图书)
已发行 2007年12月31日
ISBN13 9783031014246
出版商 Springer International Publishing AG
页数 92
商品尺寸 150 × 220 × 10 mm   ·   212 g
语言 英语  

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