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Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Emerging Materials and Technologies Oluwatobi Adeleke
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元 1.748
不含税
远程仓调货
预计送达时间 年6月10日 - 年6月26日
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其他版本：
Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Emerging Materials and Technologies
Oluwatobi Adeleke
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
496 pages, 102 Line drawings, black and white; 24 Halftones, black and white; 126 Illustrations, bla
| 介质类型 | 图书 Hardcover Book (精装硬皮书) |
| 已发行 | 2023年12月15日 |
| ISBN13 | 9781032386706 |
| 出版商 | Taylor & Francis Ltd |
| 页数 | 354 |
| 商品尺寸 | 150 × 220 × 20 mm · 662 g |
| 语言 | 英语 |
