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Silver Metallization: Stability and Reliability - Engineering Materials and Processes Daniel Adams 2008 edition
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元 833
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其他版本:
Silver Metallization: Stability and Reliability - Engineering Materials and Processes
Daniel Adams
Here is the first book to discuss the current understanding of silver metallization and its potential as a future interconnect material for integrated circuit technology. With the lowest resistivity of all metals, silver is an attractive interconnect material for higher current densities and faster switching speeds in integrated circuits.
123 pages, 1, black & white illustrations
| 介质类型 | 图书 Hardcover Book (精装硬皮书) |
| 已发行 | 2007年10月19日 |
| ISBN13 | 9781848000261 |
| 出版商 | Springer London Ltd |
| 页数 | 123 |
| 商品尺寸 | 155 × 235 × 9 mm · 317 g |
| 语言 | 英语 |